Toward Perfect TMDs Surfaces with Ion Bombardment and Annealing Treatment
Wan-Hsin Chen1*, Naoya Kawakami1, Jing-Wen Hsueh2, Lai-Hsiang Kuo2, Jiun-Yu Chen1, Ting-Wei Liao2, Chia-Nung Kuo3,4, Chin-Shan Lue3,4,5, Yu-Ling Lai6, Yao-Jane Hsu6, Der-Hsien Lien7, Chenming Hu8, Jyh-Pin Chou9, Meng-Fan Luo2, Chun-Liang Lin1
1Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
2Department of Physics, National Central University, Jhongli, Taiwan
3Department of Physics, National Cheng Kung University, Tainan, Taiwan
4Taiwan Consortium of Emergent Crystalline Materials, National Science and Technology Council, Taipei, Taiwan
5Program on Key Materials, Academy of Innovative Semiconductor and Sustainable Manufacturing, National Cheng Kung University, Tainan, Taiwan
6Nanoscience Group, National Synchrotron Radiation Research Center, Hsinchu, Taiwan
7Institute of Electronic Engineering, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
8International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
9Department of Physics, National Changhua University of Education, Changhua, Taiwan
* Presenter:Wan-Hsin Chen, email:lucychen.ep05g@g2.nctu.edu.tw
Layered transition metal dichalcogenides (TMDs) are two-dimensional materials exhibiting a variety of unique features with great potential for future electronic and optoelectronic applications. Ideally, a defect-free surface is expected in layered TMDs due to their self-terminated nature. In reality, TMDs’ surfaces are imperfect. High defect density is commonly observed despite their preparation methods (either by exfoliation or growth methods). Recent efforts have focused on delicate controls of growth conditions to reduce the defect density, but creating a defect-free surface remains challenging. In this work, we propose a counterintuitive approach to largely remove surface defects in layered TMDs by a two-step process: the surface was firstly bombarded by Ar+, followed by a post-annealing process. We show that more defects were created on the as-cleaved PtTe2 and PdTe2 surfaces after the Ar+ bombardment. Surprisingly, all defects were removed after an annealing process in the vacuum. The self-recovery process of the TMDs’ surface is directly monitored by scanning tunneling microscopy (STM). The recovered surfaces are further characterized by reflection high-energy electron diffraction (RHEED) and X-ray photoelectron spectroscopy (PES). The mechanism of the two-step process is explained by density functional theory (DFT). This work offers a new method to repair the surfaces of layered TMDs and could potentially be used in device-level applications.
Keywords: self-healing, 2D materials, defects, ion bombardment, surface modification