Study of atomic diffusion characteristics through microchannels

Yu-Chi Chen^1*, Shao-Cheng Fang¹, Hsiu-Hsuan Lin¹, Jing-Wu Dong², Yi-Hsin Chen^1,3

¹Department of Physics, National Sun Yat-Sen University, Kaohsiung, Taiwan
²Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan
³Center for Quantum Technology, Hsinchu, Taiwan

* Presenter:Yu-Chi Chen, email:moneychen125@gmail.com

We studied the atomic diffusion mechanism via quasi-one-dimension microchannels at different temperatures. After recording the atomic absorption signals daily for several months and analyzing the vapor transport dynamics, we can investigate the atomic diffusion characteristics. The surface coating time was derived through the slowly growing absorption signals. The dwell time of the atom on the glass was dependent on vapor temperature. Based on mass flow rate, higher temperatures increase the atomic transport time, implying the atom that loading into the micro-structure becomes faster. We provide a useful diffusion model for the future implementation of miniaturized quantum devices.

Keywords: Atomic diffusion, Knudsen number, Dwell time, Coating time, Mass flow rate